Chemical Mechanical Planarization Of Semiconductor Materials

Author: M.R. Oliver
Editor: Springer Science & Business Media
ISBN: 3662062348
Size: 18,99 MB
Format: PDF, ePub
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This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.

Advances In Chemical Mechanical Planarization Cmp

Author: Suryadevara Babu
Editor: Woodhead Publishing
ISBN: 0081002181
Size: 13,44 MB
Format: PDF, ePub, Mobi
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Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. Considers techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for particular materials Addresses consumables and process control for improved CMP

Advances In Chemical Mechanical Polishing

Author: Duane S. Boning
Editor:
ISBN:
Size: 12,22 MB
Format: PDF, Kindle
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While now in widespread use in integrated circuit fabrication, chemical-mechanical polishing (CMP) is also starting to appear in a surprisingly wide range of applications, with a growing variety of processes and technologies. Applications include planarization of surface topography, "polish back" or creation of in-laid materials in other structures, and reduction of surface roughness (e.g., for 3D wafer bonding and substrate engineering). This volume, the seventh in an annual series on CMP, presents new advances in fundamental understanding, development, and applications of CMP. CMP of both conventional and nonconventional materials are discussed. Conventional materials polished using CMP include silicon, oxides and nitrides, polysilicon, and other insulating films, as well as copper, tungsten, barrier films, and other metal films. Nonconventional materials include those of increasing importance in advanced semiconductor, MEMS, and nanotechnologies, such as low-k dielectrics and polymer, nickel, and ruthenium films. CMP in IC fabrication continues to pose substantial problems-for virgin silicon wafer preparation, shallow-trench isolation (STI) structures, and poly or other deeptrench structure formation, as well as copper and low-k metal interconnect. New developments in CMP pads (grooving, fixed abrasive, ceramic coated) and slurries (SiO2, Al2O3, CeO2, coated or doped, polymer or BN as abrasive) are presented. Novel polishing methods and equipment such as controlled high-pressure atmosphere, water jet conditioning or novel polishing head designs are described. Advances in CMP process understanding and modeling are also highlighted.

Wafer Bonding

Author: Marin Alexe
Editor: Springer Science & Business Media
ISBN: 9783540210498
Size: 16,64 MB
Format: PDF, Kindle
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During the past decade direct wafer bonding has developed into a mature materials integration technology. This book presents state-of-the-art reviews of the most important applications of wafer bonding written by experts from industry and academia. The topics include bonding-based fabrication methods of silicon-on-insulator, photonic crystals, VCSELs, SiGe-based FETs, MEMS together with hybrid integration and laser lift-off. The non-specialist will learn about the basics of wafer bonding and its various application areas, while the researcher in the field will find up-to-date information about this fast-moving area, including relevant patent information.

Organic Semiconductors In Sensor Applications

Author: Daniel A. Bernards
Editor: Springer Science & Business Media
ISBN: 9783540763147
Size: 10,93 MB
Format: PDF
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Organic semiconductors offer unique characteristics which have prompted the application of organic semiconductors and their devices in physical, chemical, and biological sensors. This book covers this emerging field by discussing both optically- and electrically-based sensor concepts. Novel transducers based on organic light-emitting diodes and organic thin-film transistors, as well as systems-on-a-chip architectures are presented. Functionalization techniques are also outlined.

Design For Advanced Manufacturing Technologies And Processes

Author: LaRoux K. Gillespie
Editor: McGraw Hill Professional
ISBN: 1259587460
Size: 15,13 MB
Format: PDF, ePub, Docs
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Cutting-edge coverage of the new processes, materials, and technologies that are revolutionizing the manufacturing industry Expertly edited by a past president of the Society of Manufacturing Engineers, this state-of-the-art resource picks up where the bestselling Design for Manufacturability Handbook left off. Within its pages, readers will find detailed, clearly written coverage of the materials, technologies, and processes that have been developed and adopted in the manufacturing industry over the past sixteen years. More than this, the book also includes hard-to-find technical guidance and application information that can be used on the job to actually apply these cutting-edge processes and technologies in a real-world setting. Essential for manufacturing engineers and designers, Design for Advanced Manufacturing is enhanced by a host of international contributors, making the book a true global resource. • Information on the latest technologies and processes such as 3-D printing, nanotechnology, laser cutting, prototyping, additive manufacturing, and CAD/CAM software tools • Coverage of new materials including nano, smart, and shape-memory alloys, in steels, glass, plastics, and composites

The British National Bibliography

Author: Arthur James Wells
Editor:
ISBN:
Size: 14,91 MB
Format: PDF, Mobi
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American Book Publishing Record

Author:
Editor:
ISBN:
Size: 16,68 MB
Format: PDF, ePub
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Gettering Defects In Semiconductors

Author: Victor A. Perevostchikov
Editor: Springer Science & Business Media
ISBN: 9783540262442
Size: 15,88 MB
Format: PDF, Mobi
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Gettering Defects in Semiconductors fulfills three basic purposes: – to systematize the experience and research in exploiting various gettering techniques in microelectronics and nanoelectronics; – to identify new directions in research, particularly to enhance the perspective of professionals and young researchers and specialists; – to fill a gap in the contemporary literature on the underlying semiconductor-material theory. The authors address not only well-established gettering techniques but also describe contemporary trends in gettering technologies from an international perspective. The types and properties of structural defects in semiconductors, their generating and their transforming mechanisms during fabrication are described. The primary emphasis is placed on classifying and describing specific gettering techniques, their specificity arising from both their position in a general technological process and the regimes of their application. This book addresses both engineers and material scientists interested in semiconducting materials theory and also undergraduate and graduate students in solid–state microelectronics and nanoelectronics. A comprehensive list of references provides readers with direction for further reading.

Polishing Of Diamond Materials

Author: Yiqing Chen
Editor: Springer Science & Business Media
ISBN: 1849964084
Size: 14,33 MB
Format: PDF, Mobi
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Diamond has a unique combination of properties, such as the highest hardness and thermal conductivity among any known material, high electrical resistivity, a large optical band gap and a high transmission, good resistance to chemical erosion, low adhesion and friction, and extremely low thermal expansion coefficient. As such, diamond has been a desirable material in a wide range of applications in mechanical, chemical, optical, thermal and electrical engineering. In many of the cases, the surface of a diamond component or element must have a superior finish, often down to a surface roughness of nanometers. Nevertheless, due to its extreme hardness and chemical inertness, the polishing of diamond and its composites has been a sophisticated process. Polishing of Diamond Materials will provide a state-of-the-art analysis, both theoretically and experimentally, of the most commonly used polishing techniques for mono/poly-crystalline diamond and chemical vapour deposition (CVD) diamond films, including mechanical, chemo-mechanical, thermo-chemical, high energy beam, dynamic friction and other polishing techniques. The in-depth discussions will be on the polishing mechanisms, possible modelling, material removal rate and the quality control of these techniques. A comparison of their advantages and drawbacks will be carried out to provide the reader with a useful guideline for the selection and implementation of these polishing techniques. Polishing of Diamond Materials will be of interest to researchers and engineers in hard materials and precision manufacturing, industry diamond suppliers, diamond jewellery suppliers and postgraduate students in the area of precision manufacturing.